30 results
Fluorescence Correlation Spectroscopic Investigation of Surface Adsorption of CMP Slurry Additives on Abrasive Particles
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1560 / 2013
- Published online by Cambridge University Press:
- 30 September 2013, mrss13-1560-bb04-04
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- 2013
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Micromachined Lateral Force Sensors for Characterization of Microscale Surface Forces During Chemical Mechanical Polishing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1085 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1085-T05-11
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- 2008
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Dielectric Recovery of Plasma Damaged Organosilicate Low-k Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1079 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1079-N02-10
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- 2008
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Copper CMP with Composite Polymer Core - Silica Shell Abrasives: A Defectivity Study
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1079 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1079-N11-04
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- 2008
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Effect of CH4 Plasma Treatment on O2 Plasma Ashed Organosilicate Low-k Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 990 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0990-B03-12
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- 2007
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Micromachined Shear Stress Sensors for Characterization of Surface Forces During Chemical Mechanical Polishing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C06-03
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- 2007
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Determining Pad-Wafer Contact using Dual Emission Laser Induced Fluorescence
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C01-04
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- 2007
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Composite polymer core – ceria shell abrasive particles during silicon oxide CMP
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C08-04
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- 2007
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Particle Metrology in CMP Slurries - Potential and Limitations of Relevant Measuring Methods
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C04-02
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- 2007
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New Particle Metrology for CMP Slurries
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C09-01
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- 2007
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Measurement of Interactions between Abrasive Silica Particles and Copper, Titanium, Tungsten and Tantalum
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C05-03
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- 2007
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AFM Measurements of Adhesion between CMP Slurry Particles and Copper
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- Journal:
- MRS Online Proceedings Library Archive / Volume 914 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0914-F12-05
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- 2006
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Applications of Raman Spectroscopy in Cu CMP: In-situ Detection of Chemical Species in the Slurry
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- Journal:
- MRS Online Proceedings Library Archive / Volume 914 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0914-F12-02
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- 2006
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Studies of the Coefficient of Thermal Expansion of Low-k ILD Materials by X-Ray Reflectivity
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- Journal:
- MRS Online Proceedings Library Archive / Volume 914 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0914-F11-02
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- 2006
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Challenges of Ultra Low-k Dielectric Measurement and Plasma Damage Assessment
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- Journal:
- MRS Online Proceedings Library Archive / Volume 914 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0914-F04-02
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- 2006
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Quantitative In-Situ Measurement of Asperity Compression Under the Wafer During Polishing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W5.4
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- 2005
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Instantaneous Fluid Film Imaging in Chemical Mechanical Planarization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W2.3
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- 2005
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AFM Measurements of Adhesion between Actual CMP Slurry Particles and Various Substrates
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W2.5
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- 2005
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Integration Challenges for Chemical Mechanical Polishing of Cu/Low-κ Interconnects
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- Journal:
- MRS Online Proceedings Library Archive / Volume 767 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, F7.4
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- 2003
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Advances in Characterization of CMP Consumables
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- Journal:
- MRS Bulletin / Volume 27 / Issue 10 / October 2002
- Published online by Cambridge University Press:
- 31 January 2011, pp. 766-771
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- October 2002
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